Chromium Sputtering Target, Chromium Target are available in varying sizes
The traditional sintering process of high purity chromium sputtering target prepared by powder metallurgy is analyzed and optimized. The experimental results show that the target density can be effectively guaranteed by processing the sputtering target with "mould pressing + sintering" or "cold isostatic pressing + sintering" and controlling the sintering temperature reasonably.
| Grades: | Chrome Sputtering target |
| | Purity: 99.5%, 99.9%, 99.95% |
| Chromium Alloy | AlCr, CrAl, CrSi, TiCr etc |
| Density: | 7.19g/cm3 |
| Shape: | Round Shape , Tube Shape and Plate Shape. |
Sizes:
Plate sputtering targets:
Thickness: 0.04 to 1.40" (1.0 to 35mm).
Width up to 20"(50 to 500mm).
Length: 3.9" to 6.56 feet( 100-2000mm)
other sizes as requested.
Cylinder sputtering targets:
3.94 Dia. x 1.58"(100 Dia. x 40mm)
2.56 Dia. x 1.58" (65 Dia. x 40mm)
or 63*32mm other sizes as requested.
Tube sputtering targets:
2.76 OD x 0.28 WT x 39.4”L (70 OD x 7 WT x 1000mm L)
3.46 OD x 0.39 WT x 48.4”L (88 OD x 10 WT x 1230mm L)
other sizes as requested.
The effect of different processing methods on the sintering density of chromium target. In the process of mechanical pressing, two-way pressing is adopted without any molding agent and deoxidizer. The target density of Cr ring is 78% - 80% by mechanical pressing + vacuum sintering; the target density of Cr plate sputtering target is more than 82% by cold isostatic pressing + vacuum sintering; after rolling, the target density of Cr plate is increased to 90% - 95%; the sputtering target density of Cr alloy is more than 98% by hot pressing. By optimizing the sintering time and temperature, the sintering cost of chromium ring target is greatly reduced.
Application:
1. Metal chromium purity 99% - 99.5%: used for alloy additives, cermet, powder metallurgy, hard alloy, diamond tools, diamond products, electrical alloy, flux cored wire, welding materials, aluminum alloy additives, thermal spraying materials, high temperature and high wear-resistant materials, optical coating materials, chemical products, etc.
2. Purity of metal chromium 99.5% - 99.9%: used for physical vapor deposition, high temperature alloy, hot isostatic pressing chromium target raw materials, cermet, hard alloy addition, welding materials, diamond tools, laser cladding, spraying, etc.
3. The purity of metal chromium is more than 99.9%; it is used for aerospace materials, steam turbines, coating targets, etc.
| Type | Application | Main alloy | Request |
| Semiconductor | Preparation of core materials for integrated circuits | W. Tungsten titanium (WTI), Ti, Ta, Al alloy, Cu, etc., with a purity of more than 4N or 5N | Highest technical requirements, ultra-high purity metal, high precision size, high integration |
| Screen Display | Sputtering technology ensures uniformity of film production, improves productivity and reduces cost | Niobium target, Silicon target, Cr target, molybdenum target, MoNb, Al target, Aluminum alloy target, Copper target, Copper alloy target | High technical requirements, high-purity materials, large material area and high degree of uniformity |
| Decorate | It is used for coating on the surface of products to beautify the effect of wear resistance and corrosion resistance | Chromium target, titanium target, zirconium (Zr), nickel, tungsten, titanium aluminum, CRSI, CrTi, cralzr, stainless steel target | mainly used for decoration, energy saving, etc |
| Tooling | Strengthen the surface of tools and moulds, improve the service life and the quality of manufactured parts | TiAl target, Cr Al target, Cr target, Ti target, tin, tic, Al203, etc | High performance requirements and long service life |
| Solar photovoltaic | Sputtered thin film technology for the fabrication of the fourth generation thin film solar cells | Zinc aluminum oxide target, zinc oxide target, zinc aluminum target, molybdenum target, cadmium sulfide (CDS) target, copper indium gallium selenium, etc | Wide Application |
| Electronic accessories | For film resistance and film capacitance | NiCr target, NiCr target, Cr Si target, Ta target, NiCr Al target, etc | Small size, good stability and small resistance temperature coefficient are required for electronic devices |
| Information storage | For making magnetic memory | Cr based, Co based, CO Fe based, Ni based alloys | High storage density, high transmission speed |
