Sputtering Targets Ti50Al50
JX specilizes in produce high quality Sputtering Targets Ti50Al50 ,sputtering target, ceramic target, metal target.
The products are applied to various fields of vacuum coating by various methods (magnetron sputtering, vacuum plating, etc.) : Scientific research, aerospace, automotive, microelectronics, integrated circuit industry, light source, optics, decoration, flat panel display industry, information storage industry, data storage and so on.
1. Metal Target
Nickel target, Titanium target, Zinc target, Chromium target, Magnesium target, Niobium target, Tin target, Aluminum target, Indium target, Iron target, Zirconium target, Silicon target, Copper target, Tantalum target, Germanium target, Silver target, Gold target, Gadolinium target, Lanthanum target, Yttrium target, Cerium target, Hafnium target, Molybdenum target, Tungsten target, Stainless steel target, Zirconium Aluminum target, Nickel Iron target, Titanium Aluminum target, Nickel Chromium target, Copper Indium Gallium Selenium target, Aluminum Silicon target, Zinc Aliminum target etc.
2. Ceramic material Target
ITO target, AZO target, IGZO target, Magnesium oxide target, Yttrium oxide target, Iron oxide target, Nickel oxide target, Chromium oxide target, Zinc oxide target, Zinc sulfide target, Cadmium sulfide target, Molybdenum sulfide target, Silicon dioxide target, Silicon monoxide target, Cerium oxide target, Zirconium dioxide target, Niobium pentoxide target, Titanium dioxide target, Molybdenum disulfide target, Hafnium dioxide target, Titanium diboride target, Zirconium diboride target, Tungsten trioxide target, Aluminum trioxide target, Tantalum pentoxide target, Magnesium fluoride target, Yttrium fluoride target, Zinc selenide target, Aluminum nitride target, Silicon nitride target, Boron nitride target, Titanium nitride target, Silicon carbide target, Lithium niobate target, Praseodymium titanate target, Barium titanate target, Lanthanum titanate target etc.
3. Alloy material Target
Titanium Aluminium Ti-Al, Aluminum Silicate Al-Si, Aluminum Titanium Al-Ti, Silver Copper Ag-Cu, Aluminum Magnesium Al-Mg, Cobalt iron boron Co-Fe-B, Copper Indium Gallium Cu-In-Ga, ferrimanganic Fe-Mn, Indium tin In-Sn, Cobalt Iron Co-Fe, Nickel Cobalt Ni-Co, Nickel Iron Ni-Fe, Nickel chromium Ni-Cr, Nickel zirconium Ni-Zr, Nickel Aluminum Ni-Al, Nickel Copper Ni-Cu, Nickel Vanadium Ni-V, Titanium tungsten Ti-W, Zinc Aluminum Zn-Al, Aluminium Titanium Boron Al-Ti-B, Aluminium Vanadium Al-V, Aluminium Scandium Al-Sc, Copper Tin Cu-Sn, Zirconium Aluminium Zr-Al, Boron Iron etc.
Sputtering Targets Ti50Al50 Picture:
Sputtering Targets Ti50Al50 Description
| Purity | Al-Ti (35/65at%), Al/Ti (50:50 at%),AlTi 97/3wt%, AiTi 95/5wt%, AlTi 90/10wt% |
| Shape | Discs, Plate, Step (Dia ≤300mm, Thickness ≥1mm)
Rectangle, Sheet, Step (Length ≤1000mm, Width ≤300mm, Thickness ≥1mm)
Tube( Diameter< 300mm, Thickness >2mm |
| Certification | ISO 9001:2008 |
| Specification | Customized as request |
| Process | Forged , Rolling , Grinding |
| Application | 1. Electroplating; 2. Chemical engineering & Petrochemical technology; 3. Medical |
| Density/Orgin country | 4.51g/cm3 /Henan province |
| High pure metal sputtering target |
| Aluminum | Al | pellet,round,planar,rotatable target | 3N~6N |
| Chronium | Cr | 2N~3N5 |
| Platinum | Pt | 4N~5N |
| Nickel | Ni | 4N~5N |
| Cobalt | Co | 3N~4N |
| Zirconium | Zr | 2N2~4N |
| Titanium | Ti | 4N~5N |
| Copper | Cu | 4N~5N |
| Molybdenum | Mo | 3N~4N |
| Niobium | Nb | 3N5 |
| Tatalum | Ta | 4N5 |
| Tungsten | W | 3N5 |
| Hafnium | Hf | 3N |
| Vanadium | V | 2N5~3N |
| Titanium Aluminum Alloy target/Ti-Al target Ti: Al 33:67% |
| Ti | Al | Fe | Si | Mg | Cl | C | Mn | O | N |
| 46.30 | 53.20 | 0.075 | 0.066 | 0.030 | 0.013 | 0.016 | 0.008 | 0.095 | 0.003 |
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TiAl Sputtering Targets Ti50Al50 for Vacuum Coating aerospace Images
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